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  1. B200 工学部/工学研究科
  2. B200a 雑誌掲載論文
  3. 学術雑誌

Formation and micromachining of Teflon (fluorocarbon polymer) film by a completely dry process using synchrotron radiation

http://hdl.handle.net/2237/7078
http://hdl.handle.net/2237/7078
b999ff30-890e-403d-88ee-858f7361c24e
名前 / ファイル ライセンス アクション
JVB000949.pdf JVB000949.pdf (855.8 kB)
Item type 学術雑誌論文 / Journal Article(1)
公開日 2006-10-26
タイトル
タイトル Formation and micromachining of Teflon (fluorocarbon polymer) film by a completely dry process using synchrotron radiation
言語 en
著者 Inayoshi, Muneto

× Inayoshi, Muneto

WEKO 14115

en Inayoshi, Muneto

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Ito, Masafumi

× Ito, Masafumi

WEKO 14116

en Ito, Masafumi

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Hori, Masaru

× Hori, Masaru

WEKO 14117

en Hori, Masaru

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Goto, Toshio

× Goto, Toshio

WEKO 14118

en Goto, Toshio

Search repository
Hiramatsu, Mineo

× Hiramatsu, Mineo

WEKO 14119

en Hiramatsu, Mineo

Search repository
アクセス権
アクセス権 open access
アクセス権URI http://purl.org/coar/access_right/c_abf2
権利
言語 en
権利情報 Copyright (1999) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics.
抄録
内容記述 The development of a new fabrication technique of Teflon microparts using synchrotron radiation (SR) irradiation, the SR ablation process, was described. The anisotropic micromachining and thin film formation of polytetrafluoroethylene, fluorinated ethylene propylene, and perfluoroalkoxy were demonstrated using the SR ablation process. The anisotropic micromachining of Teflon with hole pattern of 2 μm diam was successfully performed, and the micromachining of Teflon with a high aspect ratio of 50 was achieved. Moreover, Teflon films with flat surface were formed at a high rate by the SR ablation of Teflon at the substrate temperature above 200 ℃.
言語 en
内容記述タイプ Abstract
出版者
言語 en
出版者 American Institute of Physics
言語
言語 eng
資源タイプ
資源タイプresource http://purl.org/coar/resource_type/c_6501
タイプ journal article
出版タイプ
出版タイプ VoR
出版タイプResource http://purl.org/coar/version/c_970fb48d4fbd8a85
DOI
関連タイプ isVersionOf
識別子タイプ DOI
関連識別子 https://doi.org/10.1116/1.590675
ISSN
収録物識別子タイプ PISSN
収録物識別子 1071-1023
書誌情報 en : Journal of Vacuum Science & Technology B

巻 17, 号 3, p. 949-956, 発行日 1999-05
フォーマット
application/pdf
著者版フラグ
値 publisher
URI
識別子 http://hdl.handle.net/2237/7078
識別子タイプ HDL
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