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Formation and micromachining of Teflon (fluorocarbon polymer) film by a completely dry process using synchrotron radiation
http://hdl.handle.net/2237/7078
http://hdl.handle.net/2237/7078b999ff30-890e-403d-88ee-858f7361c24e
名前 / ファイル | ライセンス | アクション |
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Item type | 学術雑誌論文 / Journal Article(1) | |||||
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公開日 | 2006-10-26 | |||||
タイトル | ||||||
タイトル | Formation and micromachining of Teflon (fluorocarbon polymer) film by a completely dry process using synchrotron radiation | |||||
言語 | en | |||||
著者 |
Inayoshi, Muneto
× Inayoshi, Muneto× Ito, Masafumi× Hori, Masaru× Goto, Toshio× Hiramatsu, Mineo |
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アクセス権 | ||||||
アクセス権 | open access | |||||
アクセス権URI | http://purl.org/coar/access_right/c_abf2 | |||||
権利 | ||||||
言語 | en | |||||
権利情報 | Copyright (1999) American Institute of Physics. This article may be downloaded for personal use only. Any other use requires prior permission of the author and the American Institute of Physics. | |||||
抄録 | ||||||
内容記述 | The development of a new fabrication technique of Teflon microparts using synchrotron radiation (SR) irradiation, the SR ablation process, was described. The anisotropic micromachining and thin film formation of polytetrafluoroethylene, fluorinated ethylene propylene, and perfluoroalkoxy were demonstrated using the SR ablation process. The anisotropic micromachining of Teflon with hole pattern of 2 μm diam was successfully performed, and the micromachining of Teflon with a high aspect ratio of 50 was achieved. Moreover, Teflon films with flat surface were formed at a high rate by the SR ablation of Teflon at the substrate temperature above 200 ℃. | |||||
言語 | en | |||||
内容記述タイプ | Abstract | |||||
出版者 | ||||||
言語 | en | |||||
出版者 | American Institute of Physics | |||||
言語 | ||||||
言語 | eng | |||||
資源タイプ | ||||||
資源タイプresource | http://purl.org/coar/resource_type/c_6501 | |||||
タイプ | journal article | |||||
出版タイプ | ||||||
出版タイプ | VoR | |||||
出版タイプResource | http://purl.org/coar/version/c_970fb48d4fbd8a85 | |||||
DOI | ||||||
関連タイプ | isVersionOf | |||||
識別子タイプ | DOI | |||||
関連識別子 | https://doi.org/10.1116/1.590675 | |||||
ISSN | ||||||
収録物識別子タイプ | PISSN | |||||
収録物識別子 | 1071-1023 | |||||
書誌情報 |
en : Journal of Vacuum Science & Technology B 巻 17, 号 3, p. 949-956, 発行日 1999-05 |
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application/pdf | ||||||
著者版フラグ | ||||||
値 | publisher | |||||
URI | ||||||
識別子 | http://hdl.handle.net/2237/7078 | |||||
識別子タイプ | HDL |